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Chemical vapor deposition of Al, Cu and Fe in view of the p..:
Aloui, Lyacine
NNT: 2012INPT0079. , 2012
Link:
https://theses.hal.science/tel-04252222
RT Journal T1 <Title>Chemical vapor deposition of Al, Cu and Fe in view of the processing of intermetallic phases containing films ; Dépôt chimique en phase vapeur d'Al, Cu et Fe en vue d'élaboration de films composés de phases intermétalliques</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftutoulouse3hal:oai:HAL:tel-04252222v1&Exemplar=1&LAN=DE A1 Aloui, Lyacine PB HAL CCSD YR 2012 K1 Cvd K1 Approximant K1 Al K1 Cu K1 Fe K1 Intermetallics K1 Electrical resistivity K1 Nanoindentation K1 Intermétalliques K1 Résistivité électrique K1 [CHIM.MATE]Chemical Sciences/Material chemistry K1 [SPI.GPROC]Engineering Sciences [physics]/Chemical and Process Engineering JF NNT: 2012INPT0079 LK http://dx.doi.org/https://theses.hal.science/tel-04252222 DO https://theses.hal.science/tel-04252222 SF ELIB - SuUB Bremen
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