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1 Ergebnisse
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Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐..:
Li, Jinxiong
;
Ju, Shanshan
;
Tang, Yupu
...
Advanced Functional Materials. 34 (2024) 28 - p. , 2024
Link:
https://doi.org/10.1002/adfm.202401170
RT Journal T1 <Title>Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐Deposited Indium Oxide Thin‐Film Transistors Enabled by Plasma Fluorination</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_adfm.202401170&Exemplar=1&LAN=DE A1 Li, Jinxiong A1 Ju, Shanshan A1 Tang, Yupu A1 Li, Jiye A1 Li, Xiao A1 Tian, Xu A1 Zhu, Jianzhang A1 Ge, Qingqin A1 Lu, Lei A1 Zhang, Shengdong A1 Wang, Xinwei PB Wiley YR 2024 SN 1616-301X SN 1616-3028 JF Advanced Functional Materials VO 34 IS 28 LK http://dx.doi.org/https://doi.org/10.1002/adfm.202401170 DO https://doi.org/10.1002/adfm.202401170 SF ELIB - SuUB Bremen
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