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Electrochemical Ultrathin Metal‐Atomic Layer Deposition for..:
Jeevanandham, Sampathkumar
;
Maji, Ankur
;
Acharya, Anubhab
...
Advanced Functional Materials. 34 (2024) 12 - p. , 2024
Link:
https://doi.org/10.1002/adfm.202470065
RT Journal T1
Electrochemical Ultrathin Metal‐Atomic Layer Deposition for Silica Microenvironment‐Assisted Cu‐Based Catalysis (Adv. Funct. Mater. 12/2024)
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_adfm.202470065&Exemplar=1&LAN=DE A1 Jeevanandham, Sampathkumar A1 Maji, Ankur A1 Acharya, Anubhab A1 Kumari, Nitee A1 Gu, Byeong Su A1 Yoon, Youngkwan A1 Choi, Hee Cheul A1 Kumar, Amit A1 Lee, In Su PB Wiley YR 2024 SN 1616-301X SN 1616-3028 JF Advanced Functional Materials VO 34 IS 12 LK http://dx.doi.org/https://doi.org/10.1002/adfm.202470065 DO https://doi.org/10.1002/adfm.202470065 SF ELIB - SuUB Bremen
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