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Synthesis of Gallane‐Amine adducts as potential precursors ..:
Lorberth, Jörg
;
Dorn, Reiner
;
Wocadlo, Sigrid
...
Advanced Materials. 4 (1992) 9 - p. 576-579 , 1992
Link:
https://doi.org/10.1002/adma.19920040911
RT Journal T1
Synthesis of Gallane‐Amine adducts as potential precursors for GaAs and (AlGa)as MOVPE processes and the crystal structure of the {gallane · 1,3‐bis(dimethylamino)propane} adduct H3Ga · N(CH3)2(CH2)3N(CH3)2
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_adma.19920040911&Exemplar=1&LAN=DE A1 Lorberth, Jörg A1 Dorn, Reiner A1 Wocadlo, Sigrid A1 Massa, Werner A1 Göbel, Ernst O. A1 Marschner, Thomas A1 Protzmann, Harry A1 Zsebök, Otto A1 Stolz, Wolfgang PB Wiley YR 1992 SN 0935-9648 SN 1521-4095 JF Advanced Materials VO 4 IS 9 SP 576 OP 579 LK http://dx.doi.org/https://doi.org/10.1002/adma.19920040911 DO https://doi.org/10.1002/adma.19920040911 SF ELIB - SuUB Bremen
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