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1 Ergebnisse
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Hierarchical Self‐Assembly of Block Copolymers for Lithogra..:
Kim, Bong Hoon
;
Shin, Dong Ok
;
Jeong, Seong‐Jun
...
Advanced Materials. 20 (2008) 12 - p. 2303-2307 , 2008
Link:
https://doi.org/10.1002/adma.200702285
RT Journal T1
Hierarchical Self‐Assembly of Block Copolymers for Lithography‐Free Nanopatterning
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_adma.200702285&Exemplar=1&LAN=DE A1 Kim, Bong Hoon A1 Shin, Dong Ok A1 Jeong, Seong‐Jun A1 Koo, Chong Min A1 Jeon, Sang Chul A1 Hwang, Wook Jung A1 Lee, Sumi A1 Lee, Moon Gyu A1 Kim, Sang Ouk PB Wiley YR 2008 SN 0935-9648 SN 1521-4095 JF Advanced Materials VO 20 IS 12 SP 2303 OP 2307 LK http://dx.doi.org/https://doi.org/10.1002/adma.200702285 DO https://doi.org/10.1002/adma.200702285 SF ELIB - SuUB Bremen
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