I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Highly Versatile and Robust Materials for Soft Imprint Lith..:
Campos, Luis M.
;
Meinel, Ines
;
Guino, Rosette G.
...
Advanced Materials. 20 (2008) 19 - p. 3728-3733 , 2008
Link:
https://doi.org/10.1002/adma.200800330
RT Journal T1
Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_adma.200800330&Exemplar=1&LAN=DE A1 Campos, Luis M. A1 Meinel, Ines A1 Guino, Rosette G. A1 Schierhorn, Martin A1 Gupta, Nalini A1 Stucky, Galen D. A1 Hawker, Craig J. PB Wiley YR 2008 SN 0935-9648 SN 1521-4095 JF Advanced Materials VO 20 IS 19 SP 3728 OP 3733 LK http://dx.doi.org/https://doi.org/10.1002/adma.200800330 DO https://doi.org/10.1002/adma.200800330 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)