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Development of a kinetic model for the moderate temperature..:
Ponton, Simon
;
Vergnes, Hugues
;
Samelor, Diane
...
AIChE Journal. 64 (2018) 11 - p. 3958-3966 , 2018
Link:
https://doi.org/10.1002/aic.16222
RT Journal T1
Development of a kinetic model for the moderate temperature chemical vapor deposition of SiO2 films from tetraethyl orthosilicate and oxygen
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_aic.16222&Exemplar=1&LAN=DE A1 Ponton, Simon A1 Vergnes, Hugues A1 Samelor, Diane A1 Sadowski, Daniel A1 Vahlas, Constantin A1 Caussat, Brigitte PB Wiley YR 2018 SN 0001-1541 SN 1547-5905 JF AIChE Journal VO 64 IS 11 SP 3958 OP 3966 LK http://dx.doi.org/https://doi.org/10.1002/aic.16222 DO https://doi.org/10.1002/aic.16222 SF ELIB - SuUB Bremen
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