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Use of Supramolecular Assemblies as Lithographic Resists:
Lewis, Scott M.
;
Fernandez, Antonio
;
DeRose, Guy A.
...
Angewandte Chemie International Edition. 56 (2017) 24 - p. 6749-6752 , 2017
Link:
https://doi.org/10.1002/anie.201700224
RT Journal T1 <Title>Use of Supramolecular Assemblies as Lithographic Resists</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_anie.201700224&Exemplar=1&LAN=DE A1 Lewis, Scott M. A1 Fernandez, Antonio A1 DeRose, Guy A. A1 Hunt, Matthew S. A1 Whitehead, George F. S. A1 Lagzda, Agnese A1 Alty, Hayden R. A1 Ferrando‐Soria, Jesus A1 Varey, Sarah A1 Kostopoulos, Andreas K. A1 Schedin, Fredrik A1 Muryn, Christopher A. A1 Timco, Grigore A. A1 Scherer, Axel A1 Yeates, Stephen G. A1 Winpenny, Richard E. P. PB Wiley YR 2017 SN 1433-7851 SN 1521-3773 JF Angewandte Chemie International Edition VO 56 IS 24 SP 6749 OP 6752 LK http://dx.doi.org/https://doi.org/10.1002/anie.201700224 DO https://doi.org/10.1002/anie.201700224 SF ELIB - SuUB Bremen
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