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1 Ergebnisse
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Superclean Growth of Graphene Using a Cold‐Wall Chemical Va..:
Jia, Kaicheng
;
Ci, Haina
;
Zhang, Jincan
...
Angewandte Chemie International Edition. 59 (2020) 39 - p. 17214-17218 , 2020
Link:
https://doi.org/10.1002/anie.202005406
RT Journal T1 <Title>Superclean Growth of Graphene Using a Cold‐Wall Chemical Vapor Deposition Approach</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_anie.202005406&Exemplar=1&LAN=DE A1 Jia, Kaicheng A1 Ci, Haina A1 Zhang, Jincan A1 Sun, Zhongti A1 Ma, Ziteng A1 Zhu, Yeshu A1 Liu, Shengnan A1 Liu, Junling A1 Sun, Luzhao A1 Liu, Xiaoting A1 Sun, Jingyu A1 Yin, Wanjian A1 Peng, Hailin A1 Lin, Li A1 Liu, Zhongfan PB Wiley YR 2020 SN 1433-7851 SN 1521-3773 JF Angewandte Chemie International Edition VO 59 IS 39 SP 17214 OP 17218 LK http://dx.doi.org/https://doi.org/10.1002/anie.202005406 DO https://doi.org/10.1002/anie.202005406 SF ELIB - SuUB Bremen
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