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Chemical speciation and mapping of the Si in Si doped LFP i..:
Norouzi Banis, Mohammad
;
Wang, Zhiqiang
;
Rousselot, Steeve
...
The Canadian Journal of Chemical Engineering. 97 (2019) 8 - p. 2211-2217 , 2019
Link:
https://doi.org/10.1002/cjce.23430
RT Journal T1 <Title>Chemical speciation and mapping of the Si in Si doped LFP ingot with synchrotron radiation technique</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_cjce.23430&Exemplar=1&LAN=DE A1 Norouzi Banis, Mohammad A1 Wang, Zhiqiang A1 Rousselot, Steeve A1 Liu, Yulong A1 Hu, Yongfeng A1 Talebi‐Esfandarani, Majid A1 Bibienne, Thomas A1 Gauthier, Michel A1 Li, Ruying A1 Liang, Guoxian A1 Dollé, Mickaël A1 Sauriol, Pierre A1 Sham, Tsun‐Kong A1 Sun, Xueliang PB Wiley YR 2019 SN 0008-4034 SN 1939-019X JF The Canadian Journal of Chemical Engineering VO 97 IS 8 SP 2211 OP 2217 LK http://dx.doi.org/https://doi.org/10.1002/cjce.23430 DO https://doi.org/10.1002/cjce.23430 SF ELIB - SuUB Bremen
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