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1 Ergebnisse
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Atomic Vapor Deposition of Titanium Nitride as Metal Electr..:
Lukosius, Mindaugas
;
Wenger, Christian
;
Pasko, Sergej
...
Chemical Vapor Deposition. 14 (2008) 5-6 - p. 123-128 , 2008
Link:
https://doi.org/10.1002/cvde.200806695
RT Journal T1
Atomic Vapor Deposition of Titanium Nitride as Metal Electrodes for Gate‐last CMOS and MIM Devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_cvde.200806695&Exemplar=1&LAN=DE A1 Lukosius, Mindaugas A1 Wenger, Christian A1 Pasko, Sergej A1 Müssig, Hans‐Joachim A1 Seitzinger, Bernhard A1 Lohe, Christoph PB Wiley YR 2008 SN 0948-1907 SN 1521-3862 JF Chemical Vapor Deposition VO 14 IS 5-6 SP 123 OP 128 LK http://dx.doi.org/https://doi.org/10.1002/cvde.200806695 DO https://doi.org/10.1002/cvde.200806695 SF ELIB - SuUB Bremen
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