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Etching of Nb2O5 Thin Films by NbCl5:
Knapas, Kjell
;
Rahtu, Antti
;
Ritala, Mikko
Chemical Vapor Deposition. 15 (2009) 10-12 - p. 269-273 , 2009
Link:
https://doi.org/10.1002/cvde.200906795
RT Journal T1 <Title>Etching of Nb2O5 Thin Films by NbCl5</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_cvde.200906795&Exemplar=1&LAN=DE A1 Knapas, Kjell A1 Rahtu, Antti A1 Ritala, Mikko PB Wiley YR 2009 SN 0948-1907 SN 1521-3862 JF Chemical Vapor Deposition VO 15 IS 10-12 SP 269 OP 273 LK http://dx.doi.org/https://doi.org/10.1002/cvde.200906795 DO https://doi.org/10.1002/cvde.200906795 SF ELIB - SuUB Bremen
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