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Numerical Analysis of Substrate‐Incident Carbon Flux in Low..:
ODA, AKINORI
;
KOUSAKA, HIROYUKI
Electronics and Communications in Japan. 98 (2015) 9 - p. 31-39 , 2015
Link:
https://doi.org/10.1002/ecj.11727
RT Journal T1 <Title>Numerical Analysis of Substrate‐Incident Carbon Flux in Low‐Pressure Radio‐Frequency CH4 Plasmas for Deposition of Diamond‐Like Carbon Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_ecj.11727&Exemplar=1&LAN=DE A1 ODA, AKINORI A1 KOUSAKA, HIROYUKI PB Wiley YR 2015 SN 1942-9533 SN 1942-9541 JF Electronics and Communications in Japan VO 98 IS 9 SP 31 OP 39 LK http://dx.doi.org/https://doi.org/10.1002/ecj.11727 DO https://doi.org/10.1002/ecj.11727 SF ELIB - SuUB Bremen
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