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Design of high‐χ block copolymers for lithography:
Durand, William J.
;
Blachut, Gregory
;
Maher, Michael J.
...
Journal of Polymer Science Part A: Polymer Chemistry. 53 (2014) 2 - p. 344-352 , 2014
Link:
https://doi.org/10.1002/pola.27370
RT Journal T1 <Title>Design of high‐χ block copolymers for lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_pola.27370&Exemplar=1&LAN=DE A1 Durand, William J. A1 Blachut, Gregory A1 Maher, Michael J. A1 Sirard, Stephen A1 Tein, Summer A1 Carlson, Matthew C. A1 Asano, Yusuke A1 Zhou, Sunshine X. A1 Lane, Austin P. A1 Bates, Christopher M. A1 Ellison, Christopher J. A1 Willson, C. Grant PB Wiley YR 2014 SN 0887-624X SN 1099-0518 JF Journal of Polymer Science Part A: Polymer Chemistry VO 53 IS 2 SP 344 OP 352 LK http://dx.doi.org/https://doi.org/10.1002/pola.27370 DO https://doi.org/10.1002/pola.27370 SF ELIB - SuUB Bremen
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