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1 Ergebnisse
1
HBr Plasma Treatment Versus VUV Light Treatment to Improve ..:
Pargon, Erwine
;
Azarnouche, Laurent
;
Fouchier, Marc
...
Plasma Processes and Polymers. 8 (2011) 12 - p. 1184-1195 , 2011
Link:
https://doi.org/10.1002/ppap.201100107
RT Journal T1
HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_ppap.201100107&Exemplar=1&LAN=DE A1 Pargon, Erwine A1 Azarnouche, Laurent A1 Fouchier, Marc A1 Menguelti, Kevin A1 Tiron, Raluca A1 Sourd, Claire A1 Joubert, Olivier PB Wiley YR 2011 SN 1612-8850 SN 1612-8869 JF Plasma Processes and Polymers VO 8 IS 12 SP 1184 OP 1195 LK http://dx.doi.org/https://doi.org/10.1002/ppap.201100107 DO https://doi.org/10.1002/ppap.201100107 SF ELIB - SuUB Bremen
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