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1 Ergebnisse
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Cyclic etching of silicon oxide using NF3/H2 remote plasma ..:
Gill, You Jung
;
Kim, Doo San
;
Gil, Hong Seong
...
Plasma Processes and Polymers. 18 (2021) 11 - p. , 2021
Link:
https://doi.org/10.1002/ppap.202100063
RT Journal T1
Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_ppap.202100063&Exemplar=1&LAN=DE A1 Gill, You Jung A1 Kim, Doo San A1 Gil, Hong Seong A1 Kim, Ki Hyun A1 Jang, Yun Jong A1 Kim, Ye Eun A1 Yeom, Geun Young PB Wiley YR 2021 SN 1612-8850 SN 1612-8869 JF Plasma Processes and Polymers VO 18 IS 11 LK http://dx.doi.org/https://doi.org/10.1002/ppap.202100063 DO https://doi.org/10.1002/ppap.202100063 SF ELIB - SuUB Bremen
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