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1 Ergebnisse
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Effect of Low Energy Argon Ions Etching on the 4H–SiCOI Com..:
Xu, Jintao
;
Luo, Wenbo
;
Zhu, Dailei
...
physica status solidi (a). 220 (2023) 17 - p. , 2023
Link:
https://doi.org/10.1002/pssa.202300288
RT Journal T1
Effect of Low Energy Argon Ions Etching on the 4H–SiCOI Composite Substrate Prepared by Crystal‐Ion‐Slicing Technique
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_pssa.202300288&Exemplar=1&LAN=DE A1 Xu, Jintao A1 Luo, Wenbo A1 Zhu, Dailei A1 Wang, Gengyu A1 Wang, Yuedong A1 Shuai, Yao A1 Wu, Chuangui A1 Zhang, Wanli PB Wiley YR 2023 SN 1862-6300 SN 1862-6319 JF physica status solidi (a) VO 220 IS 17 LK http://dx.doi.org/https://doi.org/10.1002/pssa.202300288 DO https://doi.org/10.1002/pssa.202300288 SF ELIB - SuUB Bremen
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