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Comparative Study on the Gate‐Induced Electrical Instabilit..:
Jang, Younjin
;
Kim, Jun Shik
;
Kang, Sukin
...
physica status solidi (RRL) – Rapid Research Letters. 14 (2020) 10 - p. 2000304 , 2020
Link:
https://doi.org/10.1002/pssr.202000304
RT Journal T1 <Title>Comparative Study on the Gate‐Induced Electrical Instability of p‐Type SnO Thin‐Film Transistors with SiO2and Al2O3/SiO2Gate Dielectrics</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_pssr.202000304&Exemplar=1&LAN=DE A1 Jang, Younjin A1 Kim, Jun Shik A1 Kang, Sukin A1 Kim, Jihun A1 Lee, Yonghee A1 Kim, Kwangmin A1 Kim, Whayoung A1 Choi, Heenang A1 Kim, Nayeon A1 Eom, Taeyong A1 Chung, Taek-Mo A1 Jeon, Woojin A1 Lee, Sang Yoon A1 Hwang, Cheol Seong PB Wiley YR 2020 SN 1862-6254 SN 1862-6270 JF physica status solidi (RRL) – Rapid Research Letters VO 14 IS 10 SP 2000304 LK http://dx.doi.org/https://doi.org/10.1002/pssr.202000304 DO https://doi.org/10.1002/pssr.202000304 SF ELIB - SuUB Bremen
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