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1 Ergebnisse
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Area‐Selective Atomic Layer Deposition of MoS2 using Simult..:
Ahn, Wonsik
;
Lee, Hyangsook
;
Kim, Hoijoon
...
physica status solidi (RRL) – Rapid Research Letters. 15 (2021) 2 - p. , 2021
Link:
https://doi.org/10.1002/pssr.202000533
RT Journal T1 <Title>Area‐Selective Atomic Layer Deposition of MoS2 using Simultaneous Deposition and Etching Characteristics of MoCl5</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_pssr.202000533&Exemplar=1&LAN=DE A1 Ahn, Wonsik A1 Lee, Hyangsook A1 Kim, Hoijoon A1 Leem, Mirine A1 Lee, Heesoo A1 Park, Taejin A1 Lee, Eunha A1 Kim, Hyoungsub PB Wiley YR 2021 SN 1862-6254 SN 1862-6270 JF physica status solidi (RRL) – Rapid Research Letters VO 15 IS 2 LK http://dx.doi.org/https://doi.org/10.1002/pssr.202000533 DO https://doi.org/10.1002/pssr.202000533 SF ELIB - SuUB Bremen
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