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1 Ergebnisse
1
Integration of Dielectric and Ferroelectric Hafnium Aluminu..:
Hsu, Hsiao-Hsuan
;
Lee, Sheng
;
Liu, Hsiu-Ming
physica status solidi (RRL) – Rapid Research Letters. 14 (2020) 10 - p. 2070041 , 2020
Link:
https://doi.org/10.1002/pssr.202070041
RT Journal T1
Integration of Dielectric and Ferroelectric Hafnium Aluminum Oxides for Thin‐Film Transistor Applications
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_pssr.202070041&Exemplar=1&LAN=DE A1 Hsu, Hsiao-Hsuan A1 Lee, Sheng A1 Liu, Hsiu-Ming PB Wiley YR 2020 SN 1862-6254 SN 1862-6270 JF physica status solidi (RRL) – Rapid Research Letters VO 14 IS 10 SP 2070041 LK http://dx.doi.org/https://doi.org/10.1002/pssr.202070041 DO https://doi.org/10.1002/pssr.202070041 SF ELIB - SuUB Bremen
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