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A case study on modeling and optimizing photolithography st..:
Kim, Hyun-Jin
;
Kim, Kwang-Jae
;
Kwak, Doh-Soon
Quality and Reliability Engineering International. 26 (2010) 7 - p. 765-774 , 2010
Link:
https://doi.org/10.1002/qre.1149
RT Journal T1 <Title>A case study on modeling and optimizing photolithography stage of semiconductor fabrication process</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_qre.1149&Exemplar=1&LAN=DE A1 Kim, Hyun-Jin A1 Kim, Kwang-Jae A1 Kwak, Doh-Soon PB Wiley YR 2010 SN 0748-8017 JF Quality and Reliability Engineering International VO 26 IS 7 SP 765 OP 774 LK http://dx.doi.org/https://doi.org/10.1002/qre.1149 DO https://doi.org/10.1002/qre.1149 SF ELIB - SuUB Bremen
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