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1 Ergebnisse
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P‐62: The Process and Characteristic of new High Thickness ..:
Zhang, Jiaxiang
;
Wang, Yanqiang
;
Tong, Shuo
...
SID Symposium Digest of Technical Papers. 49 (2018) 1 - p. 1433-1435 , 2018
Link:
https://doi.org/10.1002/sdtp.12213
RT Journal T1 <Title>P‐62: The Process and Characteristic of new High Thickness Negative Photoresist</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_sdtp.12213&Exemplar=1&LAN=DE A1 Zhang, Jiaxiang A1 Wang, Yanqiang A1 Tong, Shuo A1 Zhou, Yongshan A1 Feng, Longqiang A1 Qing, Yifeng A1 Lu, Kai A1 Huang, Dongsheng A1 Chen, Si A1 Wang, Wei PB Wiley YR 2018 SN 0097-966X SN 2168-0159 JF SID Symposium Digest of Technical Papers VO 49 IS 1 SP 1433 OP 1435 LK http://dx.doi.org/https://doi.org/10.1002/sdtp.12213 DO https://doi.org/10.1002/sdtp.12213 SF ELIB - SuUB Bremen
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