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1 Ergebnisse
1
50‐3: Formation of Source and Drain Regions in Top‐Gate Sel..:
Okazaki, Kenichi
;
Obonai, Toshimitsu
;
Shima, Yukinori
...
SID Symposium Digest of Technical Papers. 49 (2018) 1 - p. 660-663 , 2018
Link:
https://doi.org/10.1002/sdtp.12333
RT Journal T1
50‐3: Formation of Source and Drain Regions in Top‐Gate Self‐Aligned Oxide Semiconductor Field‐Effect Transistor
UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_sdtp.12333&Exemplar=1&LAN=DE A1 Okazaki, Kenichi A1 Obonai, Toshimitsu A1 Shima, Yukinori A1 Yasumoto, Seiji A1 Koezuka, Junichi A1 Ishihara, Noritaka A1 Kurosawa, Yoichi A1 Yamazaki, Shunpei PB Wiley YR 2018 SN 0097-966X SN 2168-0159 JF SID Symposium Digest of Technical Papers VO 49 IS 1 SP 660 OP 663 LK http://dx.doi.org/https://doi.org/10.1002/sdtp.12333 DO https://doi.org/10.1002/sdtp.12333 SF ELIB - SuUB Bremen
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