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P‐12: High Performance Dual‐gate Dual‐layer Amorphous Oxide..:
Nag, Manoj
;
Celiker, Hikmet
;
Verschueren, Lynn
...
SID Symposium Digest of Technical Papers. 50 (2019) 1 - p. 1255-1258 , 2019
Link:
https://doi.org/10.1002/sdtp.13161
RT Journal T1 <Title>P‐12: High Performance Dual‐gate Dual‐layer Amorphous Oxide Semiconductors TFTs on PI Foil for Display Application</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_sdtp.13161&Exemplar=1&LAN=DE A1 Nag, Manoj A1 Celiker, Hikmet A1 Verschueren, Lynn A1 Smout, Steve A1 Willegems, Myriam A1 Upadhyay, Rishabh A1 Rolin, Cédric A1 Papadopoulos, Nikolaos A1 Genoe, Jan A1 Dehaene, Wim A1 Steudel, Soeren A1 Heremans, Paul A1 Myny, Kris PB Wiley YR 2019 SN 0097-966X SN 2168-0159 JF SID Symposium Digest of Technical Papers VO 50 IS 1 SP 1255 OP 1258 LK http://dx.doi.org/https://doi.org/10.1002/sdtp.13161 DO https://doi.org/10.1002/sdtp.13161 SF ELIB - SuUB Bremen
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