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P‐1.1: Co‐sputtering‐deposited Hf‐doped ITO Thin Films for ..:
Xie, Jingye
;
Zhao, Kai
;
Li, Qi
...
SID Symposium Digest of Technical Papers. 53 (2022) S1 - p. 572-574 , 2022
Link:
https://doi.org/10.1002/sdtp.16027
RT Journal T1 <Title>P‐1.1: Co‐sputtering‐deposited Hf‐doped ITO Thin Films for Thin Film Transistors Application</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_sdtp.16027&Exemplar=1&LAN=DE A1 Xie, Jingye A1 Zhao, Kai A1 Li, Qi A1 Han, Dedong A1 Wang, Yi A1 Zhang, Xing A1 Dong, Junchen PB Wiley YR 2022 SN 0097-966X SN 2168-0159 JF SID Symposium Digest of Technical Papers VO 53 IS S1 SP 572 OP 574 LK http://dx.doi.org/https://doi.org/10.1002/sdtp.16027 DO https://doi.org/10.1002/sdtp.16027 SF ELIB - SuUB Bremen
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