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1 Ergebnisse
1
P‐1.9: Enhanced Stability Under Positive Bias Temperature S..:
Xiao, Juncheng
;
Ge, Shimin
;
Jiang, Zhixiong
...
SID Symposium Digest of Technical Papers. 55 (2024) S1 - p. 654-657 , 2024
Link:
https://doi.org/10.1002/sdtp.17165
RT Journal T1 <Title>P‐1.9: Enhanced Stability Under Positive Bias Temperature Stress of Ln‐Doped InZnO Thin Film Transistors Fabricated with Back‐channel‐etch Structure</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_sdtp.17165&Exemplar=1&LAN=DE A1 Xiao, Juncheng A1 Ge, Shimin A1 Jiang, Zhixiong A1 Yuan, Dong A1 Liang, Ce A1 Xu, Miao A1 Li, Shan A1 Xu, Hongyuan A1 Zhang, Shengdong PB Wiley YR 2024 SN 0097-966X SN 2168-0159 JF SID Symposium Digest of Technical Papers VO 55 IS S1 SP 654 OP 657 LK http://dx.doi.org/https://doi.org/10.1002/sdtp.17165 DO https://doi.org/10.1002/sdtp.17165 SF ELIB - SuUB Bremen
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