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1 Ergebnisse
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64‐4: ECR Plasma Source for Copper Thin Film Dry Etching:
Jang, Jin Nyoung
;
Lee, Jong Hwa
;
Lee, Sangheon
...
SID Symposium Digest of Technical Papers. 55 (2024) 1 - p. 878-880 , 2024
Link:
https://doi.org/10.1002/sdtp.17673
RT Journal T1 <Title>64‐4: ECR Plasma Source for Copper Thin Film Dry Etching</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_sdtp.17673&Exemplar=1&LAN=DE A1 Jang, Jin Nyoung A1 Lee, Jong Hwa A1 Lee, Sangheon A1 Jung, Kiro A1 Kim, Donghoon A1 Hong, Mun-Pyo A1 Kim, Sang-Gab A1 Jang, Soo Ouk A1 Kim, Chiwoo PB Wiley YR 2024 SN 0097-966X SN 2168-0159 JF SID Symposium Digest of Technical Papers VO 55 IS 1 SP 878 OP 880 LK http://dx.doi.org/https://doi.org/10.1002/sdtp.17673 DO https://doi.org/10.1002/sdtp.17673 SF ELIB - SuUB Bremen
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