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High‐temperature diffusion barriers from Si‐rich silicon‐ni..:
Bilger, G.
;
Voss, T.
;
Schlenker, T.
.
Surface and Interface Analysis. 38 (2006) 12-13 - p. 1687-1691 , 2006
Link:
https://doi.org/10.1002/sia.2396
RT Journal T1 <Title>High‐temperature diffusion barriers from Si‐rich silicon‐nitride</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1002_sia.2396&Exemplar=1&LAN=DE A1 Bilger, G. A1 Voss, T. A1 Schlenker, T. A1 Strohm, A. PB Wiley YR 2006 SN 0142-2421 SN 1096-9918 JF Surface and Interface Analysis VO 38 IS 12-13 SP 1687 OP 1691 LK http://dx.doi.org/https://doi.org/10.1002/sia.2396 DO https://doi.org/10.1002/sia.2396 SF ELIB - SuUB Bremen
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