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Atomic Layer Deposition:

, In: Encyclopedia of Nanotechnology,

Aliano, Antonio ; Cicero, Giancarlo ; Nili, Hossein... - p. 161-171 , 2012

Link: https://doi.org/10.1007/978-90-481-9751-4_372

RT 
T1 <cTitle>Encyclopedia of Nanotechnology</cTitle>: T1 <Title>Atomic Layer Deposition</Title>

UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_978-90-481-9751-4_372&Exemplar=1&LAN=DE
				
A1 Aliano, Antonio
A1 Cicero, Giancarlo
A1 Nili, Hossein
A1 Green, Nicolas G.
A1 García-Sánchez, Pablo
A1 Ramos, Antonio
A1 Lenshof, Andreas
A1 Laurell, Thomas
A1 Qi, Aisha
A1 Chan, Peggy
A1 Yeo, Leslie
A1 Friend, James
A1 Evander, Mikael
A1 Laurell, Thomas
A1 Lenshof, Andreas
A1 Laurell, Thomas
A1 Chen, Jian
A1 Lacroix, Jean Christophe
A1 Martin, Pascal
A1 Randriamahazaka, Hyacinthe
A1 Barnes, W. Jon. P.
A1 Hoogenboom, Bart W.
A1 Fukuzawa, Kenji
A1 Hölscher, Hendrik
A1 Hölscher, Hendrik
A1 Bottos, Alessia
A1 Astanina, Elena
A1 Primo, Luca
A1 Bussolino, Federico
A1 Gao, Xuefeng
A1 Phan, Vinh-Nguyen
A1 Nguyen, Nam-Trung
A1 Yang, Chun
A1 Abgrall, Patrick
A1 Barth, Friedrich G.
A1 Gurman, Pablo
A1 Rosen, Yitzhak
A1 Auciello, Orlando
A1 Kähler, C. J.
A1 Cierpka, C.
A1 Rossi, M.
A1 Bhushan, Bharat
A1 Palacio, Manuel L. B.
A1 Dezelah, Charles L.
PB Springer Netherlands
YR 2012
SP 161
OP 171
LK http://dx.doi.org/https://doi.org/10.1007/978-90-481-9751-4_372
DO https://doi.org/10.1007/978-90-481-9751-4_372
SF ELIB - SuUB Bremen

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