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1 Ergebnisse
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Rapid thermal annealing of high dose arsenic-implanted sili..:
K�gler, R.
;
Wieser, E.
;
Otto, G.
.
Applied Physics A Solids and Surfaces. 51 (1990) 1 - p. 53-59 , 1990
Link:
https://doi.org/10.1007/bf00324465
RT Journal T1 <Title>Rapid thermal annealing of high dose arsenic-implanted silicon</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_bf00324465&Exemplar=1&LAN=DE A1 K�gler, R. A1 Wieser, E. A1 Otto, G. A1 Knothe, P. PB Springer Science and Business Media LLC YR 1990 SN 0721-7250 SN 1432-0630 JF Applied Physics A Solids and Surfaces VO 51 IS 1 SP 53 OP 59 LK http://dx.doi.org/https://doi.org/10.1007/bf00324465 DO https://doi.org/10.1007/bf00324465 SF ELIB - SuUB Bremen
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