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Dependence of glow discharge Si:H:Cl film morphology on dil..:
Danesh, P.
;
Kalitzova, M.
;
Pantchev, B.
...
Applied Physics A Solids and Surfaces. 47 (1988) 3 - p. 301-307 , 1988
Link:
https://doi.org/10.1007/bf00615936
RT Journal T1 <Title>Dependence of glow discharge Si:H:Cl film morphology on diluent gas and SiCl4 partial pressure</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_bf00615936&Exemplar=1&LAN=DE A1 Danesh, P. A1 Kalitzova, M. A1 Pantchev, B. A1 Simov, S. A1 Blasi, C. A1 Vitali, G. A1 Rossi, M. PB Springer Science and Business Media LLC YR 1988 SN 0721-7250 SN 1432-0630 JF Applied Physics A Solids and Surfaces VO 47 IS 3 SP 301 OP 307 LK http://dx.doi.org/https://doi.org/10.1007/bf00615936 DO https://doi.org/10.1007/bf00615936 SF ELIB - SuUB Bremen
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