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Relation between the presence of inhibitors and deposit mor..:
Vallés, E.
;
Pollina, R.
;
Gómez, E.
Journal of Applied Electrochemistry. 23 (1993) 5 - p. 508-515 , 1993
Link:
https://doi.org/10.1007/bf00707630
RT Journal T1 <Title>Relation between the presence of inhibitors and deposit morphology in nickel deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_bf00707630&Exemplar=1&LAN=DE A1 Vallés, E. A1 Pollina, R. A1 Gómez, E. PB Springer Science and Business Media LLC YR 1993 SN 0021-891X JF Journal of Applied Electrochemistry VO 23 IS 5 SP 508 OP 515 LK http://dx.doi.org/https://doi.org/10.1007/bf00707630 DO https://doi.org/10.1007/bf00707630 SF ELIB - SuUB Bremen
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