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Influence of the interaction potential on simulated sputter..:
Eckstein, W.
;
Hackel, S.
;
Heinemann, D.
.
Zeitschrift für Physik D Atoms, Molecules and Clusters. 24 (1992) 2 - p. 171-176 , 1992
Link:
https://doi.org/10.1007/bf01426703
RT Journal T1 <Title>Influence of the interaction potential on simulated sputtering and reflection data</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_bf01426703&Exemplar=1&LAN=DE A1 Eckstein, W. A1 Hackel, S. A1 Heinemann, D. A1 Fricke, B. PB Springer Science and Business Media LLC YR 1992 SN 0178-7683 SN 1431-5866 JF Zeitschrift für Physik D Atoms, Molecules and Clusters VO 24 IS 2 SP 171 OP 176 LK http://dx.doi.org/https://doi.org/10.1007/bf01426703 DO https://doi.org/10.1007/bf01426703 SF ELIB - SuUB Bremen
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