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Impact of rapid thermal annealing on impurities removal eff..:
Barbouche, M.
;
Zaghouani, R. Benabderrahmane
;
Benammar, N.E.
...
The International Journal of Advanced Manufacturing Technology. 106 (2019) 1-2 - p. 731-739 , 2019
Link:
https://doi.org/10.1007/s00170-019-04556-7
RT Journal T1 <Title>Impact of rapid thermal annealing on impurities removal efficiency from silicon carbide for optoelectronic applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s00170-019-04556-7&Exemplar=1&LAN=DE A1 Barbouche, M. A1 Zaghouani, R. Benabderrahmane A1 Benammar, N.E. A1 Khirouni, K. A1 Turan, R. A1 Ezzaouia, H. PB Springer Science and Business Media LLC YR 2019 SN 0268-3768 SN 1433-3015 JF The International Journal of Advanced Manufacturing Technology VO 106 IS 1-2 SP 731 OP 739 LK http://dx.doi.org/https://doi.org/10.1007/s00170-019-04556-7 DO https://doi.org/10.1007/s00170-019-04556-7 SF ELIB - SuUB Bremen
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