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Direct-on-barrier copper electroplating on ruthenium from t..:
D'Urzo, Lucia
;
Schaltin, Stijn
;
Shkurankov, Andrey
...
Journal of Materials Science: Materials in Electronics. 23 (2011) 4 - p. 945-951 , 2011
Link:
https://doi.org/10.1007/s10854-011-0525-4
RT Journal T1 <Title>Direct-on-barrier copper electroplating on ruthenium from the ionic liquid 1-ethyl-3-methylimidazolium dicyanamide</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s10854-011-0525-4&Exemplar=1&LAN=DE A1 D'Urzo, Lucia A1 Schaltin, Stijn A1 Shkurankov, Andrey A1 Plank, Harald A1 Kothleitner, Gerald A1 Gspan, Christian A1 Binnemans, Koen A1 Fransaer, Jan PB Springer Science and Business Media LLC YR 2011 SN 0957-4522 SN 1573-482X JF Journal of Materials Science: Materials in Electronics VO 23 IS 4 SP 945 OP 951 LK http://dx.doi.org/https://doi.org/10.1007/s10854-011-0525-4 DO https://doi.org/10.1007/s10854-011-0525-4 SF ELIB - SuUB Bremen
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