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Ag/HfO2-based conductive bridge memories elaborated by atom..:
Saadi, M.
;
Gonon, P.
;
Vallée, C.
...
Journal of Materials Science: Materials in Electronics. 31 (2020) 16 - p. 13487-13495 , 2020
Link:
https://doi.org/10.1007/s10854-020-03903-9
RT Journal T1 <Title>Ag/HfO2-based conductive bridge memories elaborated by atomic layer deposition: impact of inert electrode and HfO2 crystallinity on resistive switching mechanisms</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s10854-020-03903-9&Exemplar=1&LAN=DE A1 Saadi, M. A1 Gonon, P. A1 Vallée, C. A1 Jomni, F. A1 Jalaguier, E. A1 Bsiesy, A. PB Springer Science and Business Media LLC YR 2020 SN 0957-4522 SN 1573-482X JF Journal of Materials Science: Materials in Electronics VO 31 IS 16 SP 13487 OP 13495 LK http://dx.doi.org/https://doi.org/10.1007/s10854-020-03903-9 DO https://doi.org/10.1007/s10854-020-03903-9 SF ELIB - SuUB Bremen
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