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Investigation of BiFeO3/HfO2 gate stack for ferroelectric f..:
Tripathi, Pramod Narayan
;
Ojha, Sanjeev Kumar
;
Jha, Rajesh Kumar
.
Journal of Materials Science: Materials in Electronics. 32 (2021) 17 - p. 22517-22526 , 2021
Link:
https://doi.org/10.1007/s10854-021-06737-1
RT Journal T1 <Title>Investigation of BiFeO3/HfO2 gate stack for ferroelectric field effect transistors in IOT applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s10854-021-06737-1&Exemplar=1&LAN=DE A1 Tripathi, Pramod Narayan A1 Ojha, Sanjeev Kumar A1 Jha, Rajesh Kumar A1 Nazarov, Alexey PB Springer Science and Business Media LLC YR 2021 SN 0957-4522 SN 1573-482X JF Journal of Materials Science: Materials in Electronics VO 32 IS 17 SP 22517 OP 22526 LK http://dx.doi.org/https://doi.org/10.1007/s10854-021-06737-1 DO https://doi.org/10.1007/s10854-021-06737-1 SF ELIB - SuUB Bremen
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