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Advanced damage-free neutral beam etching technology to tex..:
Sekhar, Halubai
;
Fukuda, Tetsuo
;
Kubota, Tomohiro
...
Journal of Materials Science: Materials in Electronics. 32 (2021) 23 - p. 27449-27461 , 2021
Link:
https://doi.org/10.1007/s10854-021-07121-9
RT Journal T1 <Title>Advanced damage-free neutral beam etching technology to texture Si wafer with honeycomb pattern for broadband light trapping in photovoltaics</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s10854-021-07121-9&Exemplar=1&LAN=DE A1 Sekhar, Halubai A1 Fukuda, Tetsuo A1 Kubota, Tomohiro A1 Rahman, Mohammad Maksudur A1 Takato, Hidetaka A1 Kondo, Michio A1 Samukawa, Seiji PB Springer Science and Business Media LLC YR 2021 SN 0957-4522 SN 1573-482X JF Journal of Materials Science: Materials in Electronics VO 32 IS 23 SP 27449 OP 27461 LK http://dx.doi.org/https://doi.org/10.1007/s10854-021-07121-9 DO https://doi.org/10.1007/s10854-021-07121-9 SF ELIB - SuUB Bremen
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