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1 Ergebnisse
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Strong inhibition of boron dopant on IMC growth between ele..:
Wang, Chao-hong
;
Guo, Yu-bin
Journal of Materials Science: Materials in Electronics. 34 (2023) 15 - p. , 2023
Link:
https://doi.org/10.1007/s10854-023-10688-0
RT Journal T1 <Title>Strong inhibition of boron dopant on IMC growth between electroplating Co(B) deposits and lead-free solders at 250 °C</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s10854-023-10688-0&Exemplar=1&LAN=DE A1 Wang, Chao-hong A1 Guo, Yu-bin PB Springer Science and Business Media LLC YR 2023 SN 0957-4522 SN 1573-482X JF Journal of Materials Science: Materials in Electronics VO 34 IS 15 LK http://dx.doi.org/https://doi.org/10.1007/s10854-023-10688-0 DO https://doi.org/10.1007/s10854-023-10688-0 SF ELIB - SuUB Bremen
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