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A re-examination of thin-film silicon's Raman spectrum:
Cheung, Sin Hang
;
Schmidt, Kathrin
;
Baribeau, Jean-Marc
..
Journal of Materials Science: Materials in Electronics. 35 (2024) 13 - p. , 2024
Link:
https://doi.org/10.1007/s10854-024-12616-2
RT Journal T1 <Title>A re-examination of thin-film silicon's Raman spectrum</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s10854-024-12616-2&Exemplar=1&LAN=DE A1 Cheung, Sin Hang A1 Schmidt, Kathrin A1 Baribeau, Jean-Marc A1 Lockwood, David J. A1 O'Leary, Stephen K. PB Springer Science and Business Media LLC YR 2024 SN 0957-4522 SN 1573-482X JF Journal of Materials Science: Materials in Electronics VO 35 IS 13 LK http://dx.doi.org/https://doi.org/10.1007/s10854-024-12616-2 DO https://doi.org/10.1007/s10854-024-12616-2 SF ELIB - SuUB Bremen
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