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Fluid Simulation of Capacitively Coupled HBr/Ar Plasma for ..:
Gul, Banat
;
Rehman, Aman-ur
Plasma Chemistry and Plasma Processing. 36 (2016) 5 - p. 1363-1375 , 2016
Link:
https://doi.org/10.1007/s11090-016-9726-1
RT Journal T1 <Title>Fluid Simulation of Capacitively Coupled HBr/Ar Plasma for Etching Applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s11090-016-9726-1&Exemplar=1&LAN=DE A1 Gul, Banat A1 Rehman, Aman-ur PB Springer Science and Business Media LLC YR 2016 SN 0272-4324 SN 1572-8986 JF Plasma Chemistry and Plasma Processing VO 36 IS 5 SP 1363 OP 1375 LK http://dx.doi.org/https://doi.org/10.1007/s11090-016-9726-1 DO https://doi.org/10.1007/s11090-016-9726-1 SF ELIB - SuUB Bremen
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