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1 Ergebnisse
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Numerical Study of SF6/O2 Plasma Discharge for Etching Appl..:
Gul, Banat
;
Gul, Almas
;
Rehman, Aman-ur
.
Plasma Chemistry and Plasma Processing. 41 (2021) 4 - p. 1223-1238 , 2021
Link:
https://doi.org/10.1007/s11090-021-10170-x
RT Journal T1 <Title>Numerical Study of SF6/O2 Plasma Discharge for Etching Applications</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s11090-021-10170-x&Exemplar=1&LAN=DE A1 Gul, Banat A1 Gul, Almas A1 Rehman, Aman-ur A1 Ahmad, Iftikhar PB Springer Science and Business Media LLC YR 2021 SN 0272-4324 SN 1572-8986 JF Plasma Chemistry and Plasma Processing VO 41 IS 4 SP 1223 OP 1238 LK http://dx.doi.org/https://doi.org/10.1007/s11090-021-10170-x DO https://doi.org/10.1007/s11090-021-10170-x SF ELIB - SuUB Bremen
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