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Reasons for the low deposition probability of metal adatom ..:
Nikiforov, V. V.
Russian Journal of Electrochemistry. 41 (2005) 2 - p. 213-213 , 2005
Link:
https://doi.org/10.1007/s11175-005-0036-9
RT Journal T1 <Title>Reasons for the low deposition probability of metal adatom layers at single-crystal semiconductor electrodes</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s11175-005-0036-9&Exemplar=1&LAN=DE A1 Nikiforov, V. V. PB Springer Science and Business Media LLC YR 2005 SN 1023-1935 SN 1608-3342 JF Russian Journal of Electrochemistry VO 41 IS 2 SP 213 OP 213 LK http://dx.doi.org/https://doi.org/10.1007/s11175-005-0036-9 DO https://doi.org/10.1007/s11175-005-0036-9 SF ELIB - SuUB Bremen
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