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Characterization of Plasma Etching Process Damage in HgCdTe:
Gaucher, A.
;
Baylet, J.
;
Rothman, J.
..
Journal of Electronic Materials. 42 (2013) 11 - p. 3006-3014 , 2013
Link:
https://doi.org/10.1007/s11664-013-2654-4
RT Journal T1 <Title>Characterization of Plasma Etching Process Damage in HgCdTe</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s11664-013-2654-4&Exemplar=1&LAN=DE A1 Gaucher, A. A1 Baylet, J. A1 Rothman, J. A1 Martinez, E. A1 Cardinaud, C. PB Springer Science and Business Media LLC YR 2013 SN 0361-5235 SN 1543-186X JF Journal of Electronic Materials VO 42 IS 11 SP 3006 OP 3014 LK http://dx.doi.org/https://doi.org/10.1007/s11664-013-2654-4 DO https://doi.org/10.1007/s11664-013-2654-4 SF ELIB - SuUB Bremen
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