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1 Ergebnisse
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Argon Cluster Sputtering Source for ToF-SIMS Depth Profilin..:
Wang, Zhaoying
;
Liu, Bingwen
;
Zhao, Evan W.
...
Journal of the American Society for Mass Spectrometry. 26 (2015) 8 - p. 1283-1290 , 2015
Link:
https://doi.org/10.1007/s13361-015-1159-1
RT Journal T1
Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s13361-015-1159-1&Exemplar=1&LAN=DE A1 Wang, Zhaoying A1 Liu, Bingwen A1 Zhao, Evan W. A1 Jin, Ke A1 Du, Yingge A1 Neeway, James J. A1 Ryan, Joseph V. A1 Hu, Dehong A1 Zhang, Kelvin H. L. A1 Hong, Mina A1 Le Guernic, Solenne A1 Thevuthasan, Suntharampilai A1 Wang, Fuyi A1 Zhu, Zihua PB American Chemical Society (ACS) YR 2015 SN 1044-0305 JF Journal of the American Society for Mass Spectrometry VO 26 IS 8 SP 1283 OP 1290 LK http://dx.doi.org/https://doi.org/10.1007/s13361-015-1159-1 DO https://doi.org/10.1007/s13361-015-1159-1 SF ELIB - SuUB Bremen
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