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1 Ergebnisse
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Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupl..:
Woo, Jong-Chang
;
Kim, Dong-Pyo
;
Kim, Gwan-Ha
Transactions on Electrical and Electronic Materials. 23 (2022) 5 - p. 569-577 , 2022
Link:
https://doi.org/10.1007/s42341-022-00408-6
RT Journal T1 <Title>Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupled Plasma</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1007_s42341-022-00408-6&Exemplar=1&LAN=DE A1 Woo, Jong-Chang A1 Kim, Dong-Pyo A1 Kim, Gwan-Ha PB Springer Science and Business Media LLC YR 2022 SN 1229-7607 SN 2092-7592 JF Transactions on Electrical and Electronic Materials VO 23 IS 5 SP 569 OP 577 LK http://dx.doi.org/https://doi.org/10.1007/s42341-022-00408-6 DO https://doi.org/10.1007/s42341-022-00408-6 SF ELIB - SuUB Bremen
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