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The potential dependence of silicon anisotropic etching in ..:
Smith, R.L.
;
Kloeck, B.
;
De Rooij, N.
.
Journal of Electroanalytical Chemistry and Interfacial Electrochemistry. 238 (1987) 1-2 - p. 103-113 , 1987
Link:
https://doi.org/10.1016/0022-0728(87)85168-9
RT Journal T1 <Title>The potential dependence of silicon anisotropic etching in KOH at 60°c</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_0022-0728(87)85168-9&Exemplar=1&LAN=DE A1 Smith, R.L. A1 Kloeck, B. A1 De Rooij, N. A1 Collins, S.D. PB Elsevier BV YR 1987 SN 0022-0728 JF Journal of Electroanalytical Chemistry and Interfacial Electrochemistry VO 238 IS 1-2 SP 103 OP 113 LK http://dx.doi.org/https://doi.org/10.1016/0022-0728(87)85168-9 DO https://doi.org/10.1016/0022-0728(87)85168-9 SF ELIB - SuUB Bremen
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