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Influence of ion-implantation on native oxidation of Si in ..:
Yano, Fumiko
;
Hiraoka, Akiko
;
Itoga, Toshihiko
...
Applied Surface Science. 100-101 (1996) - p. 138-142 , 1996
Link:
https://doi.org/10.1016/0169-4332(96)00274-7
RT Journal T1
Influence of ion-implantation on native oxidation of Si in a clean-room atmosphere
UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_0169-4332(96)00274-7&Exemplar=1&LAN=DE A1 Yano, Fumiko A1 Hiraoka, Akiko A1 Itoga, Toshihiko A1 Kojima, Hisao A1 Kanehori, Keiichi A1 Mitsui, Yasuhiro PB Elsevier BV YR 1996 SN 0169-4332 JF Applied Surface Science VO 100-101 SP 138 OP 142 LK http://dx.doi.org/https://doi.org/10.1016/0169-4332(96)00274-7 DO https://doi.org/10.1016/0169-4332(96)00274-7 SF ELIB - SuUB Bremen
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