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Evaluation of Crystalline Defects in Thin, Strained Silicon..:
, In:
Rapid Thermal Processing for Future Semiconductor Devices
,
Kiyota, Yukihiro
;
Takeda, Kazuo
- p. 69-74 , 2003
Link:
https://doi.org/10.1016/b978-044451339-7/50010-6
RT T1 <cTitle>Rapid Thermal Processing for Future Semiconductor Devices</cTitle>: T1 <Title>Evaluation of Crystalline Defects in Thin, Strained Silicon-Germanium Epitaxial Layers by Optical Shallow Defect Analyzer</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_b978-044451339-7_50010-6&Exemplar=1&LAN=DE A1 Kiyota, Yukihiro A1 Takeda, Kazuo PB Elsevier YR 2003 SP 69 OP 74 LK http://dx.doi.org/https://doi.org/10.1016/b978-044451339-7/50010-6 DO https://doi.org/10.1016/b978-044451339-7/50010-6 SF ELIB - SuUB Bremen
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