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Rapid Thermal Annealing of (1-x)Ta2O5-xTiO2 Thin Films Form..:
, In:
Rapid Thermal Processing for Future Semiconductor Devices
,
Salam, K.M.A.
;
Konishi, H.
;
Fukuda, H.
. - p. 83-91 , 2003
Link:
https://doi.org/10.1016/b978-044451339-7/50012-x
RT T1 <cTitle>Rapid Thermal Processing for Future Semiconductor Devices</cTitle>: T1 <Title>Rapid Thermal Annealing of (1-x)Ta2O5-xTiO2 Thin Films Formed by Metalorganic Decomposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1016_b978-044451339-7_50012-x&Exemplar=1&LAN=DE A1 Salam, K.M.A. A1 Konishi, H. A1 Fukuda, H. A1 Nomura, S. PB Elsevier YR 2003 SP 83 OP 91 LK http://dx.doi.org/https://doi.org/10.1016/b978-044451339-7/50012-x DO https://doi.org/10.1016/b978-044451339-7/50012-x SF ELIB - SuUB Bremen
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